A review of Soviet semiconductor thin film research openly published in four major journals during 1970-1972, plus some earlier reports from other journals--over 200 papers in all. Recent Party directives call for mass production of high performance computers, and hence require major efforts to develop semiconductor thin film technology. Epitaxial growth is stressed particularly. Following a brief history, the report surveys the preparation research and studies of film characteristics: Structure and morphology; electrical, galvanomagnetic, acoustic, and optical properties; quantum size and space effects. Reported measurement techniques are found uninteresting, and little information was available on applications. The Soviet research appears generally to be a few years behind the United States, but is ahead in work with polymer compounds. Individual research groups appear to be pursuing local interests, with no organized or directed national effort. 129 pp. Bibliog.
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